Publications:

1.      W. Wu, R. Walmsley, W.-D. Li, X. Li and R. Williams, “Nanoimprint lithography with ≤60 nm overlay precision” Applied Physics A: Materials Science & Processing 106 (4), 767-772 (2012).

2.      Q. F. Xia, M. D. Pickett, J. J. Yang, M. X. Zhang, J. Borghetti, X. M. Li, W. Wu, G. Medeiros-Ribeiro, and R. S. Williams, "Impact of geometry on the performance of memristive nanodevices," Nanotechnology 22 (25) (2011).

3.      F. S. Ou, M. Hu, I. Naumov, A. Kim, W. Wu, A. M. Bratkovsky, X. M. Li, R. S. Williams, and Z. Y. Li, "Hot-Spot Engineering in Polygonal Nanofinger Assemblies for Surface Enhanced Raman Spectroscopy," Nano Lett. 11 (6), 2538-2542 (2011).

4.      Q. F. Xia, J. J. S. Yang, W. Wu, X. M. Li, and R. S. Williams, "Self-Aligned Memristor Cross-Point Arrays Fabricated with One Nanoimprint Lithography Step," Nano Lett. 10 (8), 2909-2914 (2010).

5.      W. Wu, M. Hu, F. S. Ou, R. S. Williams, and Z. Y. Li, "Rational Engineering of Highly Sensitive SERS Substrate Based on Nanocone Structures," in Advanced Environmental, Chemical, and Biological Sensing Technologies Vii, edited by T. VoDinh, R. A. Lieberman, and G. Gauglitz (Spie-Int Soc Optical Engineering, Bellingham, 2010), Vol. 7673.

6.      W. Wu, M. Hu, F. S. Ou, Z. Y. Li, and R. S. Williams, "Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy," Nanotechnology 21 (25) (2010).

7.      D. B. Strukov, D. R. Stewart, J. Borghetti, X. Li, M. Pickett, G. M. Ribeiro, W. Robinett, G. Snider, J. P. Strachan, W. Wu, Q. Xia, J. J. Yang, R. S. Williams, " Hybrid CMOS/Memristor Circuits," in 2010 Ieee International Symposium on Circuits and Systems (Ieee, New York, 2010), pp. 1967-1970.

8.      M. Hu, F. S. Ou, W. Wu, I. Naumov, X. M. Li, A. M. Bratkovsky, R. S. Williams, and Z. Y. Li, "Gold Nanofingers for Molecule Trapping and Detection," J Am Chem Soc 132 (37), 12820-12822 (2010).

9.      P. Chaturvedi, W. Wu, V. J. Logeeswaran, Z. N. Yu, M. S. Islam, S. Y. Wang, R. S. Williams, and N. X. Fang, "A smooth optical superlens," Appl. Phys. Lett. 96 (4), - (2010).

10.  Q. F. Xia, W. Robinett, M. W. Cumbie, N. Banerjee, T. J. Cardinali, J. J. Yang, W. Wu, X. M. Li, W. M. Tong, D. B. Strukov, G. S. Snider, G. Medeiros-Ribeiro, and R. S. Williams, "Memristor-CMOS Hybrid Integrated Circuits for Reconfigurable Logic," Nano Lett. 9 (10), 3640-3645 (2009).

11.  1W. Wu, E. Ponizovskaya, E. Kim, D. Cho, A. Bratkovsky, Z. N. Yu, Q. F. Xia, X. M. Li, Y. R. Shen, S. Y. Wang, and R. S. Williams, "Geometrical dependence of optical negative index meta-materials at 1.55 mu m," Appl. Phys. A-Mater. Sci. Process. 95 (4), 1119-1122 (2009).

12.  L. Vj, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, "Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer," Nano Lett. 9 (1), 178-182 (2009).

13.  D. Morecroft, J. K. W. Yang, S. Schuster, K. K. Berggren, Q. F. Xia, W. Wu, and R. S. Williams, "Sub-15 nm nanoimprint molds and pattern transfer," J. Vac. Sci. Technol. B 27 (6), 2837-2840 (2009).

14.  Z. W. Li, Y. N. Gu, L. Wang, H. X. Ge, W. Wu, Q. F. Xia, C. S. Yuan, Y. Chen, B. Cui, and R. S. Williams, "Hybrid Nanoimprint-Soft Lithography with Sub-15 nm Resolution," Nano Lett. 9 (6), 2306-2310 (2009).

15.  D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratovksy, S. Y. Wang, X. A. Zhang, F. Wang, and Y. R. Shen, "Ultrafast response of negative index metamaterials in the near-infrared," Advanced Fabrication Technologies for Micro/Nano Optics and Photonics Ii 7205, -259 (2009).

16.  D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratkovsky, S. Y. Wang, X. Zhang, F. Wang, and Y. R. Shen, "Ultrafast modulation of optical metamaterials," Opt Express 17 (20), 17652-17657 (2009).

17.  D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratkovsky, S. Y. Wang, X. Zhang, F. Wang, and Y. R. Shen, "Ultrafast modulation of optical metamaterials," 2009 Conference on Lasers and Electro-Optics and Quantum Electronics and Laser Science Conference (Cleo/Qels 2009), Vols 1-5, 2249-2250 3405 (2009).

18.  J. Borghetti, Z. Y. Li, J. Straznicky, X. M. Li, D. A. A. Ohlberg, W. Wu, D. R. Stewart, and R. S. Williams, "A hybrid nanomemristor/transistor logic circuit capable of self-programming," P Natl Acad Sci USA 106 (6), 1699-1703 (2009).

19.  W. Wu, W. M. Tong, J. Bartman, Y. F. Chen, R. Walmsley, Z. N. Yu, Q. F. Xia, I. Park, C. Picciotto, J. Gao, S. Y. Wang, D. Morecroft, J. Yang, K. K. Berggren, and R. S. Williams, "Sub-10 nm Nanoimprint Lithography by Wafer Bowing," Nano Lett. 8 (11), 3865-3869 (2008).

20.  L. Tao, S. Ramachandran, C. T. Nelson, M. Lin, L. J. Overzet, M. Goeckner, G. Lee, C. G. Willson, W. Wu, and W. Hu, "Durable diamond-like carbon templates for UV nanoimprint lithography," Nanotechnology 19 (10) (2008).

21.  V. J. Logeeswaran, A. Sarkar, M. S. Islam, N. P. Kobayashi, J. Straznicky, X. Li, W. Wu, S. Mathai, M. R. T. Tan, S. Y. Wang, and R. S. Williams, "A 14-ps full width at half maximum high-speed photoconductor fabricated with intersecting InP nanowires on an amorphous surface," Appl. Phys. A-Mater. Sci. Process. 91 (1), 1-5 (2008).

22.  Z. Y. Li, M. D. Pickett, D. Stewart, D. A. A. Ohlberg, X. M. Li, W. Wu, W. Robinett, and R. S. Williams, "Experimental demonstration of a defect-tolerant nanocrossbar demultiplexer," Nanotechnology 19 (16) (2008).

23.  Z. Y. Li, X. M. Li, D. A. A. Ohlberg, J. Straznicky, W. Wu, Z. N. Yu, J. Borghetti, W. Tong, D. Stewart, and R. S. Williams, "Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography," P Soc Photo-Opt Ins 6921, 92108-92108 92815 (2008).

24.  E. Kim, F. Wang, W. Wu, Z. N. Yu, and Y. R. Shen, "Nonlinear Optical Spectroscopy of Photonic Metamaterials," 2008 Conference on Lasers and Electro-Optics & Quantum Electronics and Laser Science Conference, Vols 1-9, 3191-3192 3638 (2008).

25.  Evgenia Kim, Feng Wang, Wei Wu, Zhaoning Yu, and Y. Ron Shen, "Nonlinear optical spectroscopy of photonic metamaterials," Physical Review B (Condensed Matter and Materials Physics) 78 (11), 113102 (2008).

26.  W. Wu, Z. N. Yu, S. Y. Wang, R. S. Williams, Y. M. Liu, C. Sun, X. Zhang, E. Kim, Y. R. Shen, and N. X. Fang, "Midinfrared metamaterials fabricated by nanoimprint lithography," Appl. Phys. Lett. 90 (6) (2007).

27.  W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, N. Fang, Y. R. Shen, A. M. Bratkovsky, W. Tong, C. Sun, X. Zhang, S. Y. Wang, and R. S. Williams, "Optical Metamaterials at near and mid-IR range fabricated by nanoimprint lithography," Appl. Phys. A-Mater. Sci. Process. 87 (2), 143-150 (2007).

28.  L. Vj, N. P. Kobayashi, W. Wu, M. S. Islam, N. X. L. Fang, S. Y. Wang, and R. S. Williams, "Smooth Ag film deposited using e-beam evaporated Ge as an intermediate layer for applications in nanoscale devices and optical superlens," Mater Res Soc Symp P 990, 171-175338 (2007).

29.  L. Vj, M. L. Chan, M. S. Islam, D. A. Horsley, W. Wu, S. Y. Wang, and R. S. Williams, "Surface deformation of metal films under controlled pressure for generating ultra-flat metal surfaces," Mater Res Soc Symp P 990, 177-182 338 (2007).

30.  D. R. Stewart, G. Gibson, G. Y. Jung, W. Wu, J. Straznicky, W. Tong, Z. Li, and R. S. Williams, "Direct-write programming of nanoscale demultiplexer arrays," Nanotechnology 18 (41) (2007).

31.  V.J. Logeeswaran, A.N. Stameroff, M.S. Islam, W. Wu, A.M. Bratkovsky, P.J. Kuekes, S.Y. Wang, and R.S. Williams, "Switching between positive and negative permeability by photoconductive coupling for modulation of electromagnetic radiation," Appl Phys A 87 (2), 209-216 (2007).

32.  V. J. Logeeswaran, M. L. Chan, Y. Bayam, M. S. Islam, D. A. Horsley, X. Li, W. Wu, S. Y. Wang, and R. S. Williams, "Ultra-smooth metal surfaces generated by pressure-induced surface deformation of thin metal films," Appl. Phys. A-Mater. Sci. Process. 87 (2), 187-192 (2007).

33.  E. Kim, Y. R. Shen, W. Wu, E. Ponizovskaya, Z. Yu, A. M. Bratkovsky, S. Y. Wang, and R. S. Williams, "Modulation of negative index metamaterials in the near-IR range," Appl. Phys. Lett. 91 (17) (2007).

34.  A. S. P. Chang, H. Tan, S. F. Bai, W. Wu, Z. N. Yu, and S. Y. Chou, "Tunable external cavity laser with a liquid-crystal subwavelength resonant grating filter as wavelength-selective mirror," Ieee Photonic Tech L 19 (13-16), 1099-1101 (2007).

35.  A. S. P. Chang, K. J. Morton, H. Tan, P. E. Murphy, W. Wu, and S. Y. Chou, "Tunable liquid crystal-resonant grating filter fabricated by nanoimprint lithography," Ieee Photonic Tech L 19 (17-20), 1457-1459 (2007).

36.  Z. Yu, W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, X. Li, Z. Li, W.M. Tong, J.A. Liddle, S.-Y. Wang, and R.S. Williams, "Fabrication of 30 nm pitch imprint moulds by frequency doubling for nanowire arrays," Nanotechnology 17 (19), 4956-4961 (2006).

37.  W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, A. Bratkovsky, N. Fang, X. Zhang, S. Y. Wang, and R. S. Williams, "Fabrication of optical meta-structure at infrared rang using nanoimprint lithography," Proceedings of International Symposium on Biophotonics, Nanophotonics and Metamaterials, 418-419 552 (2006).

38.  C. Stuart, Q. F. Xu, R. J. Tseng, Y. Yang, H. T. Hahn, Y. Chen, W. Wu, and R. S. Williams, "Nanofabrication module integrated with optical aligner," J. Vac. Sci. Technol. B 24 (2), 539-542 (2006).

39.  V.J. Logeeswaran, M.S. Islam, M.L. Chan, D.A. Horsley, W. Wu, S.-Y. Wang, and R.S. Williams, “Realization of 3D isotropic negative index materials using massively parallel and manufacturable microfabrication and micromachlning technology,”  Materials Research Society Symposium Proceedings, San Francisco, CA, 2006.

40.  N. H. Li, W. Wu, and S. Y. Chou, "Sub-20-nm alignment in nanoimprint lithography using Moire fringe," Nano Lett. 6 (11), 2626-2629 (2006).

41.  G.-Y. Jung, E. Johnston-Halperin, W. Wu, Z. Yu, S.-Y. Wang, W.M. Tong, Z. Li, J.E. Green, B.A. Sheriff, A. Boukai, Y. Bunimovich, J.R. Heath, and R.S. Williams, "Circuit fabrication at 17 nm half-pitch by nanoimprint lithography," Nano Lett. 6 (3), 351-354 (2006).

42.  J. Gao, C. Picciotto, W. Wu, and W. M. Tong, "From nanoscale displacement sensing and estimation to nanoscale alignment," J. Vac. Sci. Technol. B 24 (6), 3094-3100 (2006).

43.  J. Gao, C. Picciotto, W. Wu, I. Park, and W.M. Tong, “nDSE based overlay alignment: Enabling technology for nano metrology and fabrication”  Proceedings of SPIE - The International Society for Optical Engineering, San Jose, CA, 2006.

44.  B. Cui, W. Wu, C. Keimel, and S.Y. Chou, "Filling of nano-via holes by laser-assisted direct imprint," Microelectron Eng 83 (4-9 SPEC. ISS.), 1547-1550 (2006).

45.  W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, Z. Li, X. Li, D.A.A. Ohlberg, Y. Chen, S.-Y. Wang, J.A. Liddle, W.M. Tong, and R.S. Williams, "One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography," Appl Phys A 80 (6), 1173-1178 (2005).

46.  W.M. Tong, S.D. Hector, G.-Y. Jung, W. Wu, J. Ellenson, K. Kramer, T. Hostetler, S.K. Richards, and R.S. Williams, “Nanoimprint lithography: The path toward high tech, low cost devices,” Progress in Biomedical Optics and Imaging - Proceedings of SPIE, San Jose, CA, 2005

47.  C. Picciotto, J. Gao, E. Hoarau, W. Wu, W. Jackson, and W.M. Tong, "Overlay alignment using optical microscopy and arbitrary surface features," J Vac Sci Technol B Microelectron Nanometer Struct 23 (6), 3047-3051 (2005).

48.  C. Picciotto, J. Gao, E. Hoarau, and W. Wu, "Image displacement sensing (NDSE) for achieving overlay alignment," Appl. Phys. A-Mater. Sci. Process. 80 (6), 1287-1299 (2005).

49.  X. G. Liang, W. Zhang, M. T. Li, Q. F. Xia, W. Wu, H. X. Ge, X. Y. Huang, and S. Y. Chou, "Electrostatic force-assisted nanoimprint lithography (EFAN)," Nano Lett. 5 (3), 527-530 (2005).

50.  G.-Y. Jung, Z. Li, W. Wu, S. Ganapathiappan, X. Li, D.L. Olynick, S.Y. Wang, W.M. Tong, and R.S. Williams, "Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization," Langmuir 21 (14), 6127-6130 (2005).

51.  G.-Y. Jung, Z. Li, W. Wu, Y. Chen, D.L. Olynick, S.-Y. Wang, W.M. Tong, and R.S. Williams, "Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography," Langmuir 21 (4), 1158-1161 (2005).

52.  G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong, and R.S. Williams, “Surface engineering for resolution enhancement in nanoimprint lithography” Progress in Biomedical Optics and Imaging - Proceedings of SPIE, San Jose, CA, 2005.

53.  G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong, and R. Stanley Williams, “Resolution enhancement in nanoimprinting by surface energy engineering” 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings, Anaheim, CA, 2005.

54.  G. Y. Jung, W. Wu, H. Lee, S. Y. Wang, W. M. Tong, and R. S. Williams, "Fabrication of multi-bit crossbar circuits at sub-50 nm half-pitch by using UV-based nanoimprint lithography," J. Photopolym Sci. Technol. 18 (5), 565-570 (2005).

55.  G. Y. Jung, W. Wu, S. Ganapathiappan, D. A. A. Ohlberg, M. S. Islam, X. Li, D. L. Olynick, H. Lee, Y. Chen, S. Y. Wang, W. M. Tong, and R. S. Williams, "Issues on nanoimprint lithography with a single-layer resist structure," Appl. Phys. A-Mater. Sci. Process. 81 (7), 1331-1335 (2005).

56.  H. X. Ge, W. Wu, Z. Y. Li, G. Y. Jung, D. Olynick, Y. F. Chen, J. A. Liddle, S. Y. Wang, and R. S. Williams, "Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch," Nano Lett. 5 (1), 179-182 (2005).

57.  M. D. Austin, H. X. Ge, W. Wu, M. T. Li, Z. N. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou, "Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography," Appl. Phys. Lett. 84 (26), 5299-5301 (2004).

58.  Z. N. Yu, H. Gao, W. Wu, H. X. Ge, and S. Y. Chou, "Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff," J. Vac. Sci. Technol. B 21 (6), 2874-2877 (2003).

59.  Z. N. Yu, L. Chen, W. Wu, H. X. Ge, and S. Y. Chou, "Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography," J. Vac. Sci. Technol. B 21 (5), 2089-2092 (2003).

60.  Q. F. Xia, C. Keimel, H. X. Ge, Z. N. Yu, W. Wu, and S. Y. Chou, "Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography," Appl. Phys. Lett. 83 (21), 4417-4419 (2003).

61.  W. Wu, J. Gu, H. X. Ge, C. Keimel, and S. Y. Chou, "Room-temperature Si single-electron memory fabricated by nanoimprint lithography," Appl. Phys. Lett. 83 (11), 2268-2270 (2003).

62.  X. Y. Lei, L. Wu, P. Deshpande, Z. N. Yu, W. Wu, H. X. Ge, and S. Y. Chou, "100 nm period gratings produced by lithographically induced self-construction," Nanotechnology 14 (7), 786-790 (2003).

63.  H. Cao, Z. N. Yu, J. Wang, J. O. Tegenfeldt, R. H. Austin, E. Chen, W. Wu, and S. Y. Chou, "Fabrication of 10 nm enclosed nanofluidic channels," Appl. Phys. Lett. 81 (1), 174-176 (2002).

64.  Z. N. Yu, W. Wu, L. Chen, and S. Y. Chou, "Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications," J. Vac. Sci. Technol. B 19 (6), 2816-2819 (2001).

65.  Z. N. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, "Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography," Appl. Phys. Lett. 77 (7), 927-929 (2000).

66.  J. Wang, S. Schablitsky, Z. N. Yu, W. Wu, and S. Y. Chou, "Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography," J. Vac. Sci. Technol. B 17 (6), 2957-2960 (1999).

67.  B. Cui, W. Wu, L. S. Kong, X. Y. Sun, and S. Y. Chou, "Perpendicular quantized magnetic disks with 45 Gbits on a 4x4 cm(2) area," J. Appl. Phys. 85 (8), 5534-5536 (1999).

68.  W. Wu, B. Cui, X. Y. Sun, W. Zhang, L. Zhuang, L. S. Kong, and S. Y. Chou, "Large area high density quantized magnetic disks fabricated using nanoimprint lithography," J. Vac. Sci. Technol. B 16 (6), 3825-3829 (1998).