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Electron beam evaporator - The 10 KV electron is used for gun electron-beam evaporation of metals such as as gold, tungsten, palladium, nickel, titanium and aluminium in a high vacuum chamber. This system has a microprocessor control unit to monitor and control deposition rate. |
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Scanning electron microscope and e-beam writer -The machine is used to obtain very high magnification (approx. 20,000) images of sub-micron devices. The same machine can be used for e-beam written nano-meter scale lithography. |
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Photolithographic printer - This Karl-Suss MJB3 contact aligner can be used to transfer sub-micron patterns from a mask onto a substrate. It is capable of handling 3 inch wafers. It uses a 365nm wavelength UV source for exposure. |
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Electron Cyclotron Resonance Etcher - Provides high-quality, low-damage, deep vertical etch capabilities to transfer photolithographic patterns to semiconductor substrates. The gases used in this system are argon, chlorine, oxygen, boron-trichloride, methane and hydrogen. The etching process is controlled by computer. |
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More information: Keck Photonic Laboratory webpage |
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