Plasma Sources Science and TechnologyReflecting the growth of activity in the generation and application of plasmas in physics and engineering and, in particular, the increasing use of plasmas for materials growth and processing, light sources, display devices and charged particle sources, this journal provides a single forum for workers in this cross-disciplinary area. Plasma Sources Science and Technology reports on non-fusion plasma sources which operate at all ranges of pressure and density including neutral and non-neutral plasma sources; positive and negative ion sources; free radical sources; microwave, RF, direct current, laser and electron beam excited sources; resonant sources; plasmas for etching, deposition, polymerization, sintering; plasma sources for accelerators; lighting applications; plasma sources for medical physics; plasma sources for lasers; other applications, e.g. spacecraft thrusters, industrial arc melting; plasmas as sources of UV and x-ray radiation; plasma source design, monitoring and control; source stability and reproducibility. Low-pressure plasma sources: distribution functions; excitation-radiation equilibria; vibrational excitation; mass, momentum and energy transport; ion implantation. Low-to-medium pressure plasma sources: plasma surface interactions; high pressure sources, thermal plasmas; plasma diagnostic techniques; plasma and plasma source modelling. Holdings: v. 1, no.1 (1992)--present For USC users only. Requires USC network connection.
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